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The Present Status and Development Trend of Magnetron Sputtering Target at Home and Abroad

Time:2014-03-14 09:23:48  From:CNKI  Author:CHU Zhi - qiang

ABSTRACT: In recent year, with step and step widely of the magnetron sputtering technique application, the demands on high purity sputtering target materials are more and more great. In view of the above, the classification, application and preparation situation of the magnetron sputtering target materials are described, the several important questions about sputtering target materials which have to be resolved at moment are pointed out, moreover the development trend of sputtering target materials is also discussed and prospected in this paper.

KEY WORDS: magnetron sputtering; target materials; present status; development trend


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