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Chemical Vapor Deposition of YSZ Films for Thermal Barrier Coating

Time:2013-01-26 21:00:29  From:Journal of the Ceramic Society of Japan  Author:Takashi GOTO

 Chemical Vapor Deposition of YSZ Films for Thermal Barrier Coating

 
Takashi GOTO
Journal of the Ceramic Society of Japan
 
Abstract
   The recent development of fabrication process for thermal barrier coatings (TBCs) has been reviewed. Yttria stabilized zirconia (YSZ) is commonly applied to TBCs for Nibased super alloys. Although YSZ coatings have been commercially produced by atmospheric plasma spraying (APS) or electron beam physical vapor deposition (EBPVD), the increase in operation temperatures of gas turbines demands another fabrication process to de- velop high quality TBCs. Chemical vapor deposition (CVD) can be an alternative route to provide high perfor- mance TBCs due to its excellent conformal coverage and controllability of microstructure. This review paper has focused on the fabrication of YSZ films by CVD. A new laser CVD technique enabling high deposition rates competitive to APS and EBPVD has been also briefly introduced.
 
Keywords:Thermal barrier coating; Plasma CVD; CVD; Columnar structure; Yttria stabilized zirconia; Laser CVD; Deposition rate
 
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