Abstract: Ni-Cr binary alloy targets were widely used in sputtering industry． The phase structure，phase transformation and micro-structure under different heat treatment process of the Ni-Cr binary alloy were studied quantificationally by combining computational simulation with key experiments． The interaction between incident ions and solid target material was also simulated． The effects of sputtering factors were analyzed，thus a set of optimization process parameters were obtained in ion beam sputtering process． By using vacuum induction levitation melting technology，some pure and homogenous ingots were obtained． According to the calculated phase diagram，a series of heat treatments were carried out． The metallographic microscopy，scanning electron microscopy plus energy diffraction spectrum experiment，X-ray diffraction analysis，were employed to analyse the microstructure and phase structure． The results showed that the alloy microstructure and composition distribution in micro-zone of Ni-Cr were sensitive to heat treatment process，for example，the atomic content of Ni in BCC phase changed from 5% to 30% when the heat treatment temperature changed from 1000 to 1200 ℃ ． The reasonable heat treatment annealing temperature of the Ni-Cr alloy to obtain high quality target materials with homogeneous structure and composition was proposed． When the content of Ni was at 20% ～ 70% ( atom fraction) ，homogenization heat treatment and quenching at a high temperature range of 1200 ～ 1300 ℃ ，and uniform annealing time depended on annealing temperature ranges from 2 to 24 h． After simulating the interaction between the incident ion and solid atoms of Ni-Cr system alloy target material in the process of ion beam sputtering based on the random cascade collision theory and Monte Carlo theory，the composition of sputtering product and target material are not considerable deviation，because the Ni and Cr atomic surface energy are closed to each other． This characteristic is very positive in selection of target composition and thus the control of the film composition．
Key words: Ni-Cr sputtering target material; microstructure; homogeneous; ion beam sputtering; materials design and simulation
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