RF magnetron sputtered aluminium oxide coatings on iridium
K. MUMTAZ, J. ECHIGOYA, H. ENOKI
JOURNAL OF MATERIALS SCIENCE
Abstract
The effects of process parameters on the microstructural morphology of aluminium oxide (AI2Oa) coatings on Ir have been studied. AI2Qa coatings were deposited on It-coated isotropic graphite (IG) substrates at substrate temperatures of room temperature (RT)-1073 K, RF power of 200-600 W in an Ar, orAr + 1-10% 02, sputtering gas atmosphere by RF magnetron sputtering. AI203 coatings which were deposited at high substrate temperatures and high RF powers in an Ar, or an Ar + O2, sputtering gas atmos...Morephere were found to contain a dense, fine columnar structure with a y-AI2Oa phase, low Ar content and a relatively high hardness value of ca. 1050 Hv. Furthermore, high resolution transmission electron microscopy (HRTEM) results revealed the epitaxial growth of AI203 coatings on Ir-coated IG substrate. It was found that the interface between AI203 and Ir coatings was sharp and AI203 coatings remained intact with the Ir-coated IG substrate.
keywords:process parameters; RF magnetron; substrate temperatures; aluminium oxide; Ar sputtering; gas atmosphere; IG substrates; Ar content; Ir coatings
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